Frequency Split Elimination of Fused Silica Cylindrical Resonators by Chemical Etching
Abstract
This article describes a new trimming method for eliminating frequency split of an imperfect fused silica cylindrical resonator. First, the effect of the 4th harmonic deviation on the formation of frequency split is analyzed. Then, a chemical etching trimming method is presented to eliminate frequency split by removing the 4th harmonic deviation. Finally, we simulate the static trimming procedure of a fused silica cylindrical resonator with frequency split. The result shows that the chemical etching method is feasible and effective for frequency split elimination.
Keywords
The 4th harmonic deviation, Frequency split, Chemical etching, Trimming, FEM simulation
DOI
10.12783/dtetr/mdm2016/5003
10.12783/dtetr/mdm2016/5003
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