The Research of ZnSe Aspheric Vacuum Plasma Sputtering Polishing Surface Roughness

Abstract

In this paper, ZnSe aspheric optical element in the vacuum plasma polishing technology was studied, the paper mainly discusses the principle of plasma sputtering polishing and the effects of process parameters on ZnSe aspheric surface roughness. Firstly, the relationship between sputtering yield and ion energy and the relationship between density of the beam and the incident angle were gained by simulation research with the use of the SRIM software. And the relationship between polishing efficiency and process parameters was studied. Secondly, the relationship between polishing result and polishing rate under different process parameters was studied by the vacuum plasma polishing removal experiment with the use of the vacuum plasma equipment. The effects of rf power, ion beam energy and beam density on the polishing result were studied. The relationship between plasma characteristics and substrate surface roughness after polishing and polishing efficiency were established. Finally, with the mechanism of plasma polishing gained by simulation and experimental, the vacuum plasma polishing process parameters were obtained.